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Electroplating
Authors: ---
ISBN: 9535149911 9535104713 Year: 2012 Publisher: IntechOpen

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This book emphasizes on new applications of electroplating with consideration for environmental aspect and experimental design. Written by experienced expert from various countries, the authors come from academia and electroplating industrial players. Here, a very detailed explanation to the new application of the electroplating is followed by a solution of the environmental issue caused by the electroplating process and concluded by experimental design for optimization of electro deposition processes. Coverage included: - Preparation NiO catalyst on FeCrAl Subtrate Using Various Technique at Higher Oxidation Process - Electrochemical properties of carbon- supported metal nanoparticle prepared by electroplating methods - Fabrication of InGaN-Based Vertical Light Emitting Diodes Using Electroplating - Integration Of Electrografted Layers for the Metallization of Deep Through Silicon Vias - Biomass adsorbent for removal of toxic metal ions from electroplating industry wastewater - Resistant fungal biodiversity of electroplating effluent and their metal tolerance index - Experimental design and response surface analysis as available tools for statistical modeling and optimization of electrodeposition processes


Book
Electroplating of Nanostructures
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ISBN: 9535157655 9535122134 Year: 2015 Publisher: IntechOpen

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The electroplating was widely used to electrodeposit the nanostructures because of its relatively low deposition temperature, low cost and controlling the thickness of the coatings. With advances in electronics and microprocessor, the amount and form of the electrodeposition current applied can be controlled. The pulse electrodeposition has the interesting advantages such as higher current density application, higher efficiency and more variable parameters compared to direct current density. This book collects new developments about electroplating and its use in nanotechnology.


Multi
Interconnect technology for 32 NM and beyond
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ISBN: 1509089527 1424414474 1424414466 Year: 2008 Publisher: [United States] : IEEE,

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This tutorial will provide an overview of advanced interconnect technologies, including dielectric materials, patterning, metallization, CMP, and packaging. New processes will be discussed, such as ultra-low K dielectrics, air-gap structures, low-damage patterning methods, thin barrier and seed layers, refractory metal capping layers, and novel CMP techniques. The effect of these processes on performance and reliability will be briefly described.

Modern electroplating
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ISBN: 0471549681 9780471549680 Year: 1974 Publisher: New York, NY : John Wiley,


Book
Nano-plating (II)
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ISBN: 0128218452 9780128218457 9780128218570 0128218576 Year: 2020 Publisher: Elsevier

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Book
Nano-plating (III) : database on the microstructure of plated films
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ISBN: 0323999514 0323998941 9780323999519 9780323998949 9780323999519 Year: 2023 Publisher: Amsterdam, Netherlands : Elsevier,

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Nano-plating (III): Database of Plated Film Microstructures completes the trilogy of nanoplating books written by Tohru Watanabe. Nanoplating (I) covers microstructure formation theory of plated films, with Nanoplating (II) covering a metallurgical approach to electrochemical theory and its applications to technology. This third installment shows the relationship between composition and microstructure of 27 pure metals and 55 alloy plating films, including electrodeposition and electroless plating and provides a database of plated film microstructures. The book presents readers with an efficient reference work that helps optimize their syntheses in order to obtain specific deposit types.


Book
Electrodeposition of Composite Materials
Authors: ---
ISBN: 9535122703 9535142054 Year: 2016 Publisher: Rijeka : InTech,

Electroplating : basic principles, processes and practice
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ISBN: 9781856174510 1856174514 0080505392 9780080505398 9786611078454 128107845X Year: 2004 Publisher: Oxford ; New York : Elsevier Advanced Technology,

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Electroplating: Basic Principles, Processes and Practice offers an understanding of the theoretical background to electroplating, which is essential if the practical results are to be as required. This book is different in that it explains HOW the electrodeposition processes work, covering such topics as the elctrodeposition of composites, multilayers, whisker formation and giant magnetoresistive effects. The section on R & D approaches will be especially useful for organisations in the field. This is the first English language version of a well-known German language book from a prestigious au

Fundamentals of electrochemical deposition.
Authors: ---
ISBN: 0471168203 9780471168201 Year: 1998 Publisher: New York (N.Y.) Wiley

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It would be difficult to overstate the importance of electrochemical deposition to science and technology in the late twentieth century. If not for modern electrochemical deposition methods developed over the past decade and a half, many of today's technological wonders simply would never have been. From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition now plays a crucial role in an array of key industries. And, if the recent shift from physical to electrochemical techniques in microcircuit manufacturing is any indication, its importance will only continue to grow in the years ahead.This book offers a wide-ranging, authoritative look at state-of-the-art electrochemical deposition theory and practice. Written by an author team with extensive experience in both industry and academe, it provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology. Over the course of 18 independent chapters, Drs. Paunovic and Schlesinger present detailed coverage of the full range of electrochemical deposition processes and technologies, including:* Metal-solution interphase* Charge transfer across an interphase* Formation of an equilibrium electrode potential* Nucleation and growth of thin films* Kinetics and mechanisms of electrodeposition* Electroless deposition* In situ characterization of deposition processes* Structure and properties of deposits* Multilayered and composite thin films* Interdiffusion in thin film.Fundamentals of Electrochemical Deposition is an ideal graduate-level textbook for students of electrochemistry and related areas. It is also an indispensable working resource for all professionals who use this technology, including platers and metal finishers.Fundamentals of Electrochemical Deposition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields


Book
Morphology of Electrochemically and Chemically Deposited Metals
Authors: --- --- ---
ISBN: 3319260715 3319260731 Year: 2016 Publisher: Cham : Springer International Publishing : Imprint: Springer,

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This book describes the newest achievements in the area of electrochemically and chemically deposited metals and alloys. In particular, the book is devoted to the surface morphology of deposited metals and alloys. It contains an in-depth analysis of the influence of the parameters of electrodeposition or chemical deposition of metals and alloys, which will likely lead to technological advances in industrial settings world-wide. Professionals in electrometallurgical and electroplating plants will find the book indispensable. This book will also be useful in the automotive, aerospace, electronics, energy device and biomedical industries. In academia, researchers in electrodeposition at both undergraduate and graduate levels will find this book a very valuable resource for their courses and projects. .

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