Choose an application

• Reference Manager
• EndNote
• RefWorks (Direct export to RefWorks)

Ion bombardment --- Beams, Ion --- Bombardment, Ion --- Impact, Ion --- Ion beams --- Ion impact --- Ionic bombardment --- Collisions (Nuclear physics) --- Ions

Choose an application

• Reference Manager
• EndNote
• RefWorks (Direct export to RefWorks)

Electronics --- Ion implantation --- Ion bombardment --- Implantation, Ion --- Ion plating --- Beams, Ion --- Bombardment, Ion --- Impact, Ion --- Ion beams --- Ion impact --- Ionic bombardment --- Collisions (Nuclear physics) --- Ions --- Technologie --- Technology --- Gases. --- Ionization. --- Instrumentation

Choose an application

• Reference Manager
• EndNote
• RefWorks (Direct export to RefWorks)

This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications

Thin films --- Ion bombardment. --- Beams, Ion --- Bombardment, Ion --- Impact, Ion --- Ion beams --- Ion impact --- Ionic bombardment --- Collisions (Nuclear physics) --- Ions --- Films, Thin --- Solid film --- Solid state electronics --- Solids --- Surfaces (Technology) --- Coatings --- Thick films --- Design and construction. --- Effect of radiation on.

Choose an application

• Reference Manager
• EndNote
• RefWorks (Direct export to RefWorks)

Introduction to Ion Beam Biotechnology Yu Zengliang, PhD National Key Laboratory of Ion Beam Bioengineering Institute of Plasma Physics Chinese Academy of Sciences Hefei, China Introduction to Ion Beam Biotechnology presents an up-to-date treatment of modern ion beam biotechnology and with respect to applications of ion beam bombardment of living cellular material in the hybrid field of ion beam physics and biology. This focus affirms Springer’s commitment to publishing important introductory topics of emerging areas of interest to bioscience researchers, bioengineers, and their colleagues in affiliated disciplines. Introduction to Ion Beam Biotechnology contains reviews and discussions of contemporary and relevant topics in the field. It is intended to serve both as an introductory textbook at the graduate and advanced undergraduate levels in a bioengineering curriculum, and as a guide and reference for seasoned researchers in the field. Key Topics include: – Ion beam formation – Ion implantation fundamentals – Interaction between energetic ions and biological organisms – Reaction processes of ion implanted biological small molecules – Damage and repair of ion-bombarded DNA – Cell damage due to ion bombardment – Biological effects of ion implantation – Fundamentals of ion-bombardment-induced genetic variation – Ion beam mutation breeding of crops – Ion beam mutation breeding of microbes – Ion beam induced gene transfer – Ion beam induced synthesis of organic molecules – Single-ion bombardment mutation of cells This compendium on this novel new area of scientific research is essential reading for all academics, research scientists, biologists, and industry professionals wishing to take advantage of the latest developments in this emerging field. About the Author: Prof. Yu Zengliang is a pioneer and major figure in the field of ion beam biotechnology. An internationally recognized scientist with numerous publications, Prof. Yu is Director of the National Key Laboratory of Ion Beam Bioengineering, Institute of Plasma Physics, Chinese Academy of Sciences, at Hefei, People's Republic of China.

Ion bombardment --- Ion bombardment. --- Industrial applications. --- Beams, Ion --- Bombardment, Ion --- Impact, Ion --- Ion beams --- Ion impact --- Ionic bombardment --- Collisions (Nuclear physics) --- Ions --- Biotechnology. --- Microbiology. --- Biochemistry. --- Biochemistry, general. --- Biological chemistry --- Chemical composition of organisms --- Organisms --- Physiological chemistry --- Biology --- Chemistry --- Medical sciences --- Microbial biology --- Microorganisms --- Chemical engineering --- Genetic engineering --- Composition

Choose an application

• Reference Manager
• EndNote
• RefWorks (Direct export to RefWorks)

Ion implantation is the primary technology which is used in the semiconductor industry to introduce impurities into semiconductors to form devices and VLSI circuits. All VLSI manufacturing includes ion implantation steps. The technology has universal acceptance because of the accuracy of the number of implanted atoms, and the uniformity of the implantation across large semiconductor wafers. This book is a tutorial presentation of the physics, processes, technology and operation of ion implantation. Its purpose is to serve as a teaching manual, a source book of relevant data, and a compilation of comments from some of the world's most experienced practitioners of ion implantation. The primary problems in using ion implantation in VLSI processing are wafer cooling, dielectric charging, particulate contamination and process control. Each of these problems is addressed in a separate chapter. Each section is described from first principles in simple tutorial steps, while keeping the goal of finding answers to the most modern and complex problems in VLSI processing.

Solid state physics --- Ion bombardment. --- 538.91 --- Ion bombardment --- 538.97 --- Beams, Ion --- Bombardment, Ion --- Impact, Ion --- Ion beams --- Ion impact --- Ionic bombardment --- Collisions (Nuclear physics) --- Ions --- Structures, including transitions --- Special geometry and interaction with particles and radiation --- 538.97 Special geometry and interaction with particles and radiation --- 538.91 Structures, including transitions