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Book
Electroplating
Author:
ISBN: 0070388369 Year: 1978 Publisher: New York (N.Y.): MacGraw-Hill

Electroplating engineering handbook
Author:
ISBN: 0442220022 Year: 1984 Publisher: New York (N.Y.): Van Nostrand Reinhold

Modern electroplating
Author:
ISBN: 0471549681 9780471549680 Year: 1974 Publisher: New York, NY : John Wiley,

Modern electroplating
Authors: ---
ISBN: 0471168246 9780471168249 Year: 2000 Publisher: New York (N.Y.) Wiley

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Abstract

Fundamental Considerations. Electrodeposition of Copper Electrodeposition of Nickel Electrodeposition of Gold Electroless and Electrodeposition of Silver Tin and Tin Alloys for Lead-Free Solder Electrodeposition of Chromium Electrodeposition of Lead and Lead Alloys Electrodeposition of Tin-Lead Alloys Electrodeposition of Zinc and Zinc Alloys Electrodeposition of Iron and Iron Alloys Electrodeposition of Palladium and Palladium Alloys Nickel Alloys, Cobalt, and Cobalt Alloys Electrodeposition of Semiconductors Deposition on Nonconductors Electrodeposition of Organic Films: Conductive Polymers Electroless Deposition of Copper Electroless Deposition of Nickel Electroless Deposition of Cobalt Alloy Films Electroless Deposition of Palladium and Platinum Electroless Deposition of Gold Electroless Deposition of Alloys Preparation for Deposition Manufacturing Technologies Monitoring and Control Environmental Aspects of Electrodeposition Appendix. Index.


Book
The canning handbook on electroplating.
ISBN: 0419109501 Year: 1978 Publisher: Birmingham Canning

Fundamentals of electrochemical deposition.
Authors: ---
ISBN: 0471168203 9780471168201 Year: 1998 Publisher: New York (N.Y.) Wiley

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Abstract

It would be difficult to overstate the importance of electrochemical deposition to science and technology in the late twentieth century. If not for modern electrochemical deposition methods developed over the past decade and a half, many of today's technological wonders simply would never have been. From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition now plays a crucial role in an array of key industries. And, if the recent shift from physical to electrochemical techniques in microcircuit manufacturing is any indication, its importance will only continue to grow in the years ahead.This book offers a wide-ranging, authoritative look at state-of-the-art electrochemical deposition theory and practice. Written by an author team with extensive experience in both industry and academe, it provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology. Over the course of 18 independent chapters, Drs. Paunovic and Schlesinger present detailed coverage of the full range of electrochemical deposition processes and technologies, including:* Metal-solution interphase* Charge transfer across an interphase* Formation of an equilibrium electrode potential* Nucleation and growth of thin films* Kinetics and mechanisms of electrodeposition* Electroless deposition* In situ characterization of deposition processes* Structure and properties of deposits* Multilayered and composite thin films* Interdiffusion in thin film.Fundamentals of Electrochemical Deposition is an ideal graduate-level textbook for students of electrochemistry and related areas. It is also an indispensable working resource for all professionals who use this technology, including platers and metal finishers.Fundamentals of Electrochemical Deposition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields

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