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Experimental study of load carrying capacity of point contacts at zero entrainment velocity
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Year: 1998 Publisher: Cleveland, Ohio : National Aeronautics and Space Administration, Lewis Research Center,

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The effect of sliding speed on film thickness and pressure supporting ability of a point contact under zero entrainment velocity conditions
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Year: 2000 Publisher: Cleveland, Ohio : National Aeronautics and Space Administration, Glenn Research Center,

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On the correlation of specific film thickness and gear pitting life
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Year: 2015 Publisher: Cleveland, Ohio : National Aeronautics and Space Administration, Glenn Research Center,

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A new analysis tool assessment for rotordynamic modeling of gas foil bearings
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Year: 2010 Publisher: Cleveland, Ohio : National Aeronautics and Space Administration, Glenn Research Center,

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Dynamic response of film thickness in spiral-groove face seals
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Year: 1985 Publisher: Washington, D.C. : National Aeronautics and Space Administration, Scientific and Technical Information Branch,

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The effect of interface roughness and oxide film thickness on the inelastic response of thermal barrier coatings to thermal cycling
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Year: 1999 Publisher: Cleveland, Ohio : National Aeronautics and Space Administration, Glenn Research Center,

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Correlation of asperity contact-time fraction with elastohydrodynamic film thickness in a 20-millimeter-bore ball bearing
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Year: 1979 Publisher: Washington, D.C. : National Aeronautics and Space Administration, Scientific and Technical Information Branch,

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Ice-accretion scaling using water-film thickness parameters
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Year: 2003 Publisher: [Cleveland, Ohio] : National Aeronautics and Space Administration, Glenn Research Center,

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Enhancement of aviation fuel thermal stability characterization through application of ellipsometry
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Year: 2012 Publisher: Cleveland, Ohio : National Aeronautics and Space Administration, Glenn Research Center,

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Spectroscopic ellipsometry : practical application to thin film characterization
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ISBN: 1606507281 9781606507285 9781606507278 1606507273 Year: 2016 Publisher: New York, [New York] (222 East 46th Street, New York, NY 10017) : Momentum Press,

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Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from subnanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. It follows in the footsteps of two previous books written by one of the authors with important updates to emphasize modern instrumentation and applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.

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